Can obtain uniform brightness, high levelling power at wide current density areas Great ductility, second-processing is possible Suitable for underlying nickel plating films for PWB
Can obtain uniform brightness, levelling performance at wide current density areas Great ductility Reduce bad effect on film properties by excessive addition Easy bath control
Strong cleaning power to shorten treatment time Prevent discoloration of copper and brass by alkali Prevent excessive dissolution of zinc Easily washed off Not containing endocrine disrupting chemicals
Treatment Chemical for Copper and Its AlloysSoak Cleaner
Use as electro-cleaner for copper, brass lead frames Strong cleaning power, no damage substrates Chelating-agent free product Easy wastewater treatment
Treatment Chemical for Copper and Its AlloysElectrolytic Cleaner
Sn-Cu alloy plating bath, not containing lead Can use as lead free solder plating Can obtain stable alloy ratio at wide current density areas (Cu content:1 to 2% by weight)
Various Electroplating ChemicalTin-Copper Allloy Plating
Tin-copper alloy plating bath, not containing lead Can use as lead free solder plating Can obtain stable alloy ratio at wide current density areas (Cu content:1 to 2% by weight)
Various Electroplating ChemicalTin-Copper Allloy Plating
Lead-free, tin-copper films can be obtained Can use as the replacement of lead-based solder plating Can obtain stable alloy ratio (Cu content: 1 to 2 % by weight) at wide current density areas
Various Electroplating ChemicalTin-Copper Allloy Plating
Immersion-type electroless silver plating solution for copper Acidic bath, deposition rate 0.2μm/15min No voids between copper and silver Can obtain high adhesion silver films High bath stability
For steel, alloy 42, lead frames, hoop substrates and general cleaning Alkaline-type product Containing phosphorus, not make silicate films Low COD product
Treatment Chemical for Steel and Alloy 42 MaterialsSoak Cleaner
Lead-free product High deposition performance High film hardness is available without heat treatment The most suitable for electronic components and ceramics Can use continuously by replenishing (B content: 0.2 to 0.6% by weight)
Lead-free electroless nickel-phosphorus plating solution Excellent in fine pattern forming performance High solder wettability and solder joint strength Can use at 65℃, best for MID P content: 5% by weight
Electroless Plating Process Chemical for MIDElectroless Nickel Plating Solution
Electroless copper plating solution for MID Cyanide-free, EDTA-based product for strike plating High pattern selectivity, great deposition performance Applicable to MID by LDS structure
Electroless Plating Process Chemical for MIDAlkaline Cleaner
Electroless copper plating solution for MID Cyanide-free, EDTA-based product High bath stability, high speed plating is possible (5μm/h) High selectivity to copper
Electroless Plating Process Chemical for MIDElectroless Copper Plating Solution
Can obtain semi-bright bismuth-antimony alloy plating films (Sb content: 5 to 10 mass%) Higher film hardness and sliding performance than bismuth plating films
Cyanide-free, EDTA based product Excellent deposition performance on silver Can omit palladium activating step Also applicable to continuous conveyance system